Epson is organising its fourth annual Epson Digital Couture Project on February 6, 2018, which will lead up to Fashion Week in New York City. Designers from North and Latin America will leverage Epson’s textile printing solutions to create fashion designs around the theme “Cosmopolitan Couture with Impossible Colours – How Does Your Culture Dress-up?”
This unique fashion presentation will showcase the design possibilities made possible with Epson’s digital imaging technology.
“The future of fashion is customisation – from the colours and prints, to the size and shape of garments – all on-demand,” said Keith Kratzberg, president and CEO, Epson America. “Epson’s digital imaging technology is changing the business of fashion, providing a platform for designers to print higher quality, more unique designs for customers on-demand, as well as the ability to print just in time. This Digital Couture event showcases how the design potential and impact on the fashion marketplace is limitless.”
Prior to the fashion showcase, Epson will host a Fashion and Technology panel – a thought-provoking conversation about how digital technology is evolving the fashion industry, as well as market trends and technology’s role in fashion. Anthony Cenname, vice president and publisher at WSJ Magazine will moderate, with opening comments from Kratzberg and closing comments from Agustin Chacon, Epson America’s vice president of international marketing. Panel participants include interior designer Ryan Korban, Mark Sunderland from Thomas Jefferson University, and Aliza Licht, EVP Brand Marketing and Communications for Alice + Olivia and author of “Leave Your Mark.”
At the Digital Couture Project event, each designer or design team will tell a story through their collection via textiles created with Epson dye-sublimation printing technology. These technologies enable limitless design possibilities, with the result being original prints of the highest quality unique to each designer, on fabrics that convey their signature style.
The fourth annual Epson Digital Couture Project event will showcase the design capabilities through the featured collections of designers from North and Latin America: Brazil – Lua Luá (Michele Gevaerd), Canada (Toronto) – Hayley Elsaesser, Chile – Karyn Coo, Ecuador – Stephanie Ruiz, Guatemala – Eduardo Figueroa, Mexico – Emilio Mata, Paraguay – Ilse Jara, Peru – Ana María Guiulfo, Colombia – Lina Cantillo, United States (Los Angeles) – Candice Cuoco, United States (Miami) – Fernando Alberto, United States (Philadelphia) – Thomas Jefferson University (Alexandra Pizzigoni and Patricia Franklin), United States (New York) – threeASFOUR (Gabriel Asfour, Angela Donhauser and Adi Gil).
